SELECTED PUBLICATIONS IN REFEREED JOURNAL PAPERS:

  • R. Prasanna Venkatesh, T-Y Kwon, Y.N. Prasad, S. Ramanathan and J-G. Park, "Characterization of TMAH based cleaning solution for Post Cu-CMP application", Microelectronic Engineering (2013) 102, 74-80
  • B. J Cho, R. Prasanna Venkatesh,  T.Y. Kwon and J-G. Park "Modification of Ni based surface with V-SAM coatings for CMP applications, International Journal of Electrochemical Science (2013) 8, 4723-4734.
  • R. Prasanna Venkatesh, B.J. Cho, S. Ramanathan and J-G. Park "EIS  analysis of BTA removal by TMAH for post Cu CMP cleaning", Journal of The Electrochemical Society (2012) 159, C447-C452
  • H-M. Kim, R. Prasanna Venkatesh, Tae-Young K and J-G. Park, Influence of Anionic  polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing, J. Colloid and sciences  A-Physicochemical and Engineering Aspects (2012) 411, 122-128
  • R. Prasanna Venkatesh, Y. N. Prasad, Tae -Young, Y.J. Kang and J-G. Park, Effect of Alkaline pH on polishing and etching of single and poly crystal silicon, Japanese Journal Of Applied Physics  (2012) 51, 071301(1-6)
  • R. Prasanna Venkatesh and S. Ramanathan, "Electrochemical characterization of Cu dissolution and chemical mechanical polishing of Cu in NH4OH - H2O2 based slurries", Journal of Applied Electrochemistry (2010) 40,767-776
  • R. Prasanna Venkatesh and S. Ramanathan, "EIS studies for copper dissolution in glycine - H2O2 solutions", Journal of Solid State Electrochemistry, (2010) 14, 2057-2064
  • R. Prasanna Venkatesh, M. Bhaskar, S. Sakthivel, N.Selvaraju and M. Velan "Pilot plant studies on accelerated deactivation of hydrotreating catalysts", Petroleum Science and Technology (2010) 28, 93-102
INTERNATIONAL CONFERENCES PROCEEDINGS:

  • J-G Park, R. Prasanna Venkatesh and T-Y. Kwon,, "Material Removal Mechanism of single and polycrystalline silicon in alkaline slurry, China Semiconductor Technology International Conference  (2013) Mar 19-21, Shanghai, China, , ECS Transcations, 52 (1) 545-550
  • R. Prasanna Venkatesh, H-M. Kim, S. Ramanathan and J-G. Park "Electrochemical impedance spectroscopy analysis of BTA removal during post Cu CMP cleaning", 220th ECS meeting (2011) Oct 9-14, Boston, USA, ECS Transcations, 41 (5) 323-330
  • R. Prasanna Venkatesh, Y. Nagendra Prasad and S. Ramanathan, "Electrochemical characterization of Cu chemical mechanical polishing in aminoacids - H2O2 system, , International Conference on Planarization and Technology (2011) Nov 9-11, Seoul, S. Korea, 374-381,
  • Jung-Soo Lim, R. Prasanna Venkatesh and J-G. Park "Effect of pump pulsation on particle contamination on wafer surface in wet cleaning system", 220th ECS meeting 2011, Oct 9-14, Boston, USA , ECS Transactions, 41 (5) 221-227
  • Y. N. Prasad, R. Prasanna Venkatesh, Tae-Young K and J-G. Park, " Formulation of alkaline solution for post copper CMP cleaning, International Conference on Planarization and Technology (2010), Arizona, USA, 325-355